Drimva

Intel

LTD RET Software/Research Engineer

$150K–$285K

US, Oregon, Hillsboro · Full-time · Posted Oct 28, 2026

Experience
6+ years with a bachelor's degree, 4+ years with a master's degree, or 2+ years with a Ph.D.; professional experience in the semiconductor industry.
Education
Bachelor's, master's, or Ph.D. in a relevant field, such as Computer Science, Software Engineering, or Electrical Engineering.
Visa sponsorship
The posting refers to Intel’s U.S. immigration sponsorship guidelines but does not state a specific visa policy.

About the job

Develops and validates computational lithography and RET software to optimize mask patterns, improve manufacturability, and support future semiconductor process nodes.

What you'll do

  • Develop, implement, optimize, and validate OPC and other RET algorithms and recipes.
  • Analyze fab process data using predictive modeling, statistics, machine learning, and other data-analysis methods to develop software that compensates for lithography and etch effects.
  • Support production mask tapeout and RET validation; create technical documentation and presentations.

What they ask for

  • Relevant bachelor's degree and 6+ years of semiconductor-industry professional experience, or relevant master's degree and 4+ years, or relevant Ph.D. and 2+ years.
  • Hands-on professional experience in at least one of: pattern synthesis and mask layout manipulation; knowledge of OPC concepts and capabilities.

Nice to have

  • Understanding of techniques for developing and optimizing OPC rule-based synthesis solutions for high-volume and emerging technology nodes.

Pay

$149,600.00-284,580.00 USD (total compensation target range)

Tools

Optical Proximity Correction (OPC), Resolution Enhancement Techniques (RET), predictive modeling, statistics, machine learning

AI focus

Uses machine learning and other data-analysis techniques to develop RET software algorithms and applications that compensate for photolithography imaging and etch pattern-transfer effects.

Model-written summary · the original posting is authoritative

First seen Oct 29, 2026 · Last verified Nov 5, 2026 (UTC)