Drimva

Micron

EUV Lithography Process Development Engineer- TPG

Boise, ID - Main Site · Full-time · Posted Sep 11, 2026

Experience
3+ years of semiconductor industry experience with an M.S. or Ph.D.; alternatively, 10+ years of semiconductor process experience focused on photolithography with a B.S.
Education
M.S. or Ph.D. in Engineering, Chemistry, Physics, or a related field; alternatively, B.S. in one of those fields.

About the job

Develop and evaluate advanced lithography processes, including EUV and High NA EUV, for next-generation memory products and help prepare them for manufacturing.

What you'll do

  • Lead pathfinding activities for advanced lithography technologies, including 193nm immersion, EUV, and High NA EUV.
  • Develop and optimize EUV processes, and collaborate across technical teams on process readiness and manufacturing transfer.
  • Support EUV mask inspection and defect-reduction methods; travel approximately once per month for High NA EUV development activities.

What they ask for

  • M.S. or Ph.D. in Engineering, Chemistry, Physics, or a related field with 3+ years of semiconductor industry experience; or B.S. in one of those fields with 10+ years of semiconductor process experience focused on photolithography.
  • Understanding of EUV lithography and how it differs from DUV lithography.
  • Knowledge of 193nm immersion multiple patterning techniques, including LELE and SAQP.
  • Experience or knowledge of photolithography optics and patterning fundamentals; ability to collaborate across technical teams and communicate complex concepts.

Nice to have

  • Hands-on High NA EUV industry experience in pathfinding or technology development; photolithography simulation experience such as PROLITH or S-Litho.
  • Statistical analysis, DOE, and data analysis skills; experience with JMP, Python, or similar tools, or AI-assisted analytics.

Tools

193nm immersion, EUV, High NA EUV, LELE, SAQP, PROLITH, S-Litho, JMP

AI focus

Preferred experience using AI-assisted analytics to enhance data interpretation, anomaly detection, and yield improvement initiatives.

Model-written summary · the original posting is authoritative

First seen Oct 15, 2026 · Last verified Nov 4, 2026 (UTC)