Micron
Photo Process Engineer
Boise, ID - ID1 · Full-time · Posted Oct 9, 2026
- Experience
- 5+ years; relevant experience may also qualify with an AAS.
- Education
- Bachelor’s or Master’s degree in Engineering or a related technical field, equivalent military experience, or an AAS with 5+ years of relevant experience.
About the job
Develops and optimizes scanner metrology solutions to improve overlay, alignment accuracy, and lithography performance in advanced DRAM manufacturing.
What you'll do
- Develop, optimize, and sustain scanner metrology solutions for advanced photolithography.
- Analyze overlay performance and process control; investigate overlay errors, tool matching, and variability.
- Collaborate with process, equipment, and integration teams to resolve overlay and alignment issues.
What they ask for
- 5+ years of semiconductor industry experience focused on scanner metrology, overlay, or lithography metrology systems.
- Hands-on experience with KLA metrology tools and overlay measurement techniques, including diffraction-based overlay.
- Strong understanding of alignment and overlay fundamentals in advanced photolithography; experience troubleshooting metrology issues in a fab or manufacturing environment.
- Willingness to travel internationally for onboarding and training.
Nice to have
- Knowledge of lithography–metrology interaction and experience in high-volume manufacturing.
- Familiarity with optical overlay, scatterometry, CD metrology, SPC, data analytics, or programming platforms such as Python, JMP, or MATLAB.
Tools
KLA, Python, JMP, MATLAB, SPC
Model-written summary · the original posting is authoritative