Substrate
Process Engineer
$150K–$250K
San Francisco · On-site · Full-time · Posted Feb 5, 2026
- Experience
- 3+ years of hands-on micro- or nanofabrication experience required; 3+ years in electron microscopy and scanning probe microscopy preferred; 1+ years in inductively coupled plasma etching preferred.
- Education
- B.S. or higher degree in chemical engineering, electrical engineering, materials science, mechanical engineering, physics, or a related discipline in the physical or engineering sciences.
- Visa sponsorship
- Applicants must be legally authorized to work in the United States. This position is not eligible for visa sponsorship.
About the job
Develops and characterizes micro- and nanofabricated components, including optical devices, and helps build Substrate’s internal research facilities.
What you'll do
- Design, fabricate, and characterize nanofabricated optical and MEMS/NEMS devices in cleanroom user facilities.
- Optimize fabrication processes and develop process flows, material studies, and mask layouts.
- Plan and conduct experiments, interpret results, and contribute to installing internal research facilities.
What they ask for
- 3+ years of hands-on micro- or nanofabrication experience in cleanroom user facilities.
- Ability to work safely and collaboratively in cleanrooms and travel among Bay Area user facilities several days per week.
- Experience handling delicate samples and operating complex fabrication and characterization equipment; understanding of fabrication principles and relevant material properties.
- B.S. or higher in chemical engineering, electrical engineering, materials science, mechanical engineering, physics, or a related discipline in the physical or engineering sciences.
Nice to have
- 3+ years of experience in electron microscopy and scanning probe microscopy.
- Experience operating a Raith EBPG 5200/5200+, inductively coupled plasma etching, industrial R&D, instrument commissioning, or hazardous-chemical safety procedures.
Pay
$150,000-$250,000 USD (base salary)
Tools
photo- and electron beam lithography, thin film deposition, wet and dry etching, profilometry, ellipsometry, XPS, SEM, AFM
Model-written summary · the original posting is authoritative